Method for attaching a flexible structure to a device and a device having a flexible structure

ABSTRACT

Techniques for producing a flexible structure attached to a device. One embodiment includes the steps of providing a first substrate, providing a second substrate with a releasably attached flexible structure, providing a bonding layer on at least one of the first substrate and the flexible structure, adjoining the first and second substrate such that the flexible structure is attached at the first substrate by means of the bonding layer, and detaching the second substrate in such a way that the flexible structure remains on the first substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority under 35 U.S.C. § 119 to EuropeanPatent Application No. 05405501.7 filed Aug. 31, 2005, the entire textof which is specifically incorporated by reference herein.

BACKGROUND OF THE INVENTION

The present invention relates to a method for attaching a flexiblestructure to a device. The present invention further relates to a methodfor producing an electro-optical device being connectable by means of aflexible structure. Furthermore, the present invention relates to amethod for producing a flexible connector. Furthermore, the presentinvention relates to an electro-optical device and to a flexibleconnector.

Flexible interconnection elements such as flexible cables (flexiblecables) are widely used primarily in order to establish electricalconnections. They comprise a stack of flexible polymer-based materials,e.g. polyimide, and embedded metal structures to provide the electricalconnection (electrical flexible). Flexible cables may also be used foroptical connections (optical flexible) and/or for a flexible mechanicalconnection (mechanical flexible).

The realization of electrical, electro-optical ormicroelectro-mechanical (MEMS) type of components is based on integratedcircuit (IC) compatible wafer level processes such as silicontechnology. Such processes are well developed and standardized and serveas a cost-effective means for fabricating small, micro- andnano-devices. The introduction of flexible structures which provide aninterconnection with the devices is required for several applications.

In order to provide a flexible interconnection element connected to adevice, such as a bare chip, it is attached to a device which usuallyhas been fabricated by means of applying wafer level processes on asubstrate. The techniques for fabricating such a device are based on abottom-up process flow where layers are subsequently deposited andpatterned. The wafer surface is required to be flat or at least existingcorrugations should be small with respect to the feature size that hasto be realized in the next processing step.

To realize a flexible interconnection element on such a device, furtherwafer level process steps are required. These further process steps mayrequire a plane surface, the utilization of chemicals and/or theappliance of temperatures which do not affect the structures of thedevice fabricated prior thereto. In other words, the process steps forfabricating the flexible interconnection element may have to becompatible to the surface unevenness and to the precedingwafer-level-processes for fabricating the integrated device.Furthermore, by applying the flexible interconnection element to anintegrated device by means of wafer level processes on the substrate ofthe integrated device, it is difficult to partly release the flexibleinterconnection structure from the device surface by means of awafer-level process which is necessary to provide a flexibleinterconnection between the device and an external environment.

BRIEF SUMMARY OF THE INVENTION

According to a first aspect of the present invention a method forproducing a flexible structure attached to a device is provided. Themethod comprises the steps of providing a first substrate; providing asecond substrate; providing a flexible structure the second substrate,so that the flexible structure is releasably attached to the secondsubstrate; providing a bonding layer on at least one of the firstsubstrate and the flexible structure; adjoining the first and secondsubstrate such that the flexible structure is attached on the firstsubstrate by means of the bonding layer; and detaching the secondsubstrate in such a way that the flexible structure remains on the firstsubstrate. The first substrate can be a processed substrate. A processedsubstrate includes at least one functional element or a structuralpattern. Such structural elements can be electrical elements likeresistors, capacities, transistors, memory cells, electroopticalelements, sensors, wires, antennas, a processor, logic elements, etc.

The method of the present invention provides an improved way to providea flexible structure at a device substrate thereby less affecting devicestructures due to surface evenness, or thermal and materialincompatibilities the substrate. These advantages become even moresubstantial in connection with a processed substrate, e.g. apre-processed substrate comprising one or more devices.

Preferably, the bonding layer is structured to define a first region inwhich the flexible structure is attached on the first substrate and asecond region in which the flexible structure is uncoupled from thefirst substrate.

In a further embodiment, the first substrate is removed in the secondregion such that the flexible structure extends beyond the remainingfirst region.

It can be further provided that a sacrificial layer is provided betweenthe second substrate and the flexible structure wherein the detaching ofthe second substrate is performed by degrading the sacrificial layer.

Advantageously, the sacrificial layer is adapted such that thedetachment of the flexible structure and the second substrate isreleased by applying light through the second substrate to thesacrificial layer.

Preferably, the second substrate is transparent for the wavelength ofthe light applied to release the second substrate.

According to a preferred embodiment alignment elements are provided onthe first and second substrate arranged in such a way that the first andsecond substrate are alignable by means of the alignment elements.

The bonding layer may comprise a polymer having a lower glass transitiontemperature than each of the materials of the first and secondsubstrates and of the flexible structure. Preferably, the thermalexpansion coefficients of the first and second substrate aresubstantially equal.

Furthermore, the flexible structure can be provided including aninterconnection element as at least one of an optical, a mechanical andan electrical interconnection element.

The step of providing the flexible structure may comprise the steps ofproviding a first flexible layer on the second substrate; providing theinterconnection element on the first flexible layer; and providing asecond flexible layer to cover the first flexible layer and theinterconnection element.

It can further be provided that a further interconnection element isprovided on the second flexible layer and that a third layer is providedto cover the second flexible layer and the interconnection element.Thereby, a multi-layer flexible structure can be made.

Preferably, at least one of the materials of the first layer, the secondlayer and the third layer is selected from a group consisting of a BCBpolymer, a polyimide and a LCP (liquid crystal polymer).

The interconnection element may be provided as an electrical conductingelement, wherein the flexible structure is patterned to uncover theinterconnection element at least in a contact region, wherein thecontact region is filled with a conducting material to provide a contactelement on the flexible structure.

According to another aspect of the present invention a method forproducing an electro-optical device is provided comprising the steps ofproviding a via in a first substrate; performing the method forproducing a flexible structure attached to the first substrate asmentioned above; and connecting an optoelectronic element to theinterconnection element of the flexible structure by means of a contactelement, wherein the optoelectronic element is arranged that light iseither sent through the via, light is received through the via, or both.

Preferably, the bonding layer and the flexible structure each comprisean aperture wherein the first and the second substrates are adjoinedsuch that the aperture is aligned with the via in the second substrate.

The via and the aperture may be filled with a transparent fillingmaterial which comes in contact with the optoelectronic element.

According to a preferred embodiment the filling material is filled suchthat a surface of the first substrate opposing the surface on which theflexible structure is arranged, and the filling material in the via forma plane.

According to another aspect of the present invention a method forproducing a flexible connector is provided comprising the steps ofperforming the method for producing a flexible structure as mentionedabove; wherein the first substrate is provided such that a first and asecond area of the first substrate are defined, wherein the step ofadjoining is performed such that the flexible structure is provided tobridge the first and the second area; wherein the first and second areaare separated from the first substrate to obtain a first and a secondplug connected by the flexible structure to provide the flexibleconnector.

Preferably, the first and second areas are separated such that theflexible structure has an end which is in one plane with a front surfaceof the separated first and second area, respectively.

It may further be provided the steps of providing a groove in at leastone of the first and second area, and inserting a guide pin into thegroove.

Advantageously, an encapsulation layer is provided on the first and thesecond plug, also referred to as connector end.

The guide pin may be inserted so that the guide pin extends beyond thefront surface of the first and second plug. The guide pin may further bepulled out to form a guide cavity.

It can be provided that the first substrate includes a spacing regionbetween the first and the second area wherein the material of the firstsubstrate is removed.

According to another aspect of the present invention a device isprovided. The device comprises a processed substrate and a flexiblestructure comprising a flexible material, and preferably including aninterconnection element to provide at least one of an electrical andoptical interconnection. A structured bonding layer between thesubstrate and the flexible structure is further provided, wherein theflexible structure extends beyond the substrate to preferably providethe one of the electrical and optical interconnection.

Preferably, first and second plugs are provided at the substrate, whichare separated and which are connected by the flexible structure.

The flexible structure and at least one of the first and second plugsmay comprise a common plane front surface.

Furthermore, on at least one of the first and second connector ends anencapsulation structure may be arranged.

In at least one of the first and second connector ends a guide pin maybe arranged which protrudes from the common front surface.

Furthermore, in at least one of the first and second connector ends aguide aperture is arranged which extends from the common plane frontsurface.

Preferably, a via is arranged through the substrate and the flexiblestructure, wherein the flexible structure comprises a contact element,wherein an optoelectronic element is arranged on the flexible structuresuch that the optoelectronic element is in contact with the contactelement, wherein the optoelectronic element is directed that light iseither transmitted through the via, received through the via, or both.The via may be filled with a transparent material to guide the lightbeam to the optoelectronic element.

Furthermore, the flexible structure may comprise further contactelements which are contacted by a further device, wherein the furtherdevice comprises at least one of a driver and an amplifier circuit.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

Preferred embodiments of the present invention are discussed in detailin the following description with regard to the accompanying drawings inwhich:

FIGS. 1 a to 1 h illustrate the process states of a method for attachinga flexible interconnection element to a device such as a bare chip;

FIGS. 2 a to 2 p show process steps for attaching the flexibleinterconnection structure to a processed device in more detail,illustrating the fabrication of an optoelectronic de-vice;

FIG. 3 is a cross-sectional view of the optoelectronic elementfabricated by the process steps of FIGS. 2 a to 2 o;

FIG. 4 shows the integration of the optoelectronic element of FIG. 3 ina printed circuit board;

FIG. 5 shows an optoelectronic element wherein a through-hole is filledwith an optical polymer;

FIGS. 6 a to 6 e show process steps of a process for fabricating aconnector element having at least two plugs;

FIG. 7 shows a front view of one of the plugs of the connector elementfabricated according to the process illustrated in FIG. 6;

FIG. 8 shows a side view of the connector element fabricated by theprocess illustrated in FIGS. 6A to 6E; and

FIG. 9 shows the application of such a connector element for opticallycoupling optical guides between a backplane and a printed circuit board.

DETAILED DESCRIPTION OF THE INVENTION

The present invention beneficially includes a method for attaching aflexible interconnection element on a device. The method can be carriedout more easily and which reduces the aforementioned disadvantages inthe prior art. Particularly, the present invention provides a method forattaching a flexible interconnection element on a device less affectingthe functionality and the structures fabricated on the device inpreceding wafer level process steps.

FIGS. 1 a to 1 h illustrate exemplary process states of a method forattaching a flexible interconnection element to a device such as a barechip. According to FIG. 1 a, a first substrate 1 is provided having anupper surface 2 which is processed by wafer level process steps as knownin silicon technology. Preferably, the first substrate 1 can comprisesilicon, however, it is also possible to select another material for thesubstrate 1 which is suitable to provide the desired functionality.

In the process state shown in FIG. 1 b, the upper surface 2 of the firstsubstrate 1 has been processed such that the upper surface 2 nowincludes at least one of a functional element 4 and a structural pattern3. The functional element 4 may comprise an electronic circuit, anoptoelectronic element or the like. The structural pattern 3 isexemplarily illustrated in FIG. 1 b in the form of grooves. For furtherexplanation of the method, it is presumed that in the first substrate 1the functional element 4 is integrated as an integrated circuit.

The integrated circuit comprises contact pads (not shown) by which theintegrated circuit can be electrically connected to an externalenvironment. Usually, the surface of the processed integrated circuit isnot flat so that a further processing to provide a flexible elementcannot reliably be performed, the functional element included in thefirst substrate 1 may further be sensitive to the appliance of someagents and/or heating processes such that a provision of a flexibleinterconnection element by a continued wafer level processing of thefirst substrate 1 would not be appropriate.

As shown in FIG. 1 c, a second substrate, also referred to as carriersubstrate 5 is provided which in the described embodiment is a glasswafer of the same size as the first substrate 1. However, the size ofthe carrier substrate 5 can be larger or smaller than the size of thesubstrate 1. The carrier substrate 5 is subsequently processed andfabricated as shown and described below in more detail with respect toFIGS. 2 c to 2 g. The fabrication of the flexible interconnectionelement 6 on the carrier substrate 5 is carried out in a way that it canbe separated from the carrier substrate 5 again. The interconnectionelement 6 is formed as a shaped layer on the carrier substrate 5 insidewhich preferably at least one of electrical and optical signal lines 11,also referred to as electrical interconnection element, for theelectrical or optical transmission of signals are embedded. One possiblematerial for electrical signal lines may be copper or other conductivematerials. The flexible interconnection element 6 comprises a flexiblematerial such as a polymer e.g. BCB or the like, which provides aflexibility to be used as a flexible interconnection cable which can bebent and formed to connect the integrated circuit 4 with a predefinedlocation of an external environment.

On the upper surface of the flexible interconnection element 6, abonding layer 7 is applied and afterwards patterned so that in a firstregion 8 the bonding layer 7 is provided and removed in a second region9.

As shown in FIG. 1 e, the structure of FIG. 1 d is turned upside downand put on the structured substrate 1 in an aligned manner so that thefirst region 8 of the bonding layer 7 is brought into contact with theupper surface 2 of the first substrate 1. In an alternative embodiment,the bonding layer 7 can otherwise be applied on the upper surface 2 ofthe first substrate 1 and be patterned such that after sandwiching thefirst substrate 1 and the second substrate 5 the bonding layer 7 is incontact with the flexible interconnection element 6. By applying aheating process, the structure of FIG. 1 d and the first substrate 1 arebonded to each other in such a way that the flexible interconnectionelement 6 is fixed to the first substrate 1.

The material of the bonding layer 7 can preferably comprise a glue or apolymer material having a sufficiently low glass transition temperatureTG, preferably lower than each of the materials of the first substrate1, the second substrate 5 and the flexible interconnection element 6. Apreferred temperature herefore is e.g. less than 300° C. The material ofthe bonding layer 7 is preferably selected to achieve a bonding effectby applying a heating process without denaturalizing the polymers andother materials included in the composed structure of FIG. 1 e. It isalso preferred for the thermal expansion coefficients of the firstsubstrate 1 and second substrate 5 to be substantially equal.

As shown in FIG. 1 f, the next process step concerns the removal of thecarrier substrate 5. In the shown embodiment, the carrier substrate 5 isconnected to the flexible interconnection element 6 by means of asacrificial layer 10 which is irradiated in a manner to degrade thesacrificial layer 10. In the given embodiment, the carrier substrate 5is a glass substrate transparent to UV light of a predeterminedwavelength and the sacrificial layer 10 includes material such as apolyimide which is sensitive to the respective predetermined wavelengthof the UV light. From the outer surface of the carrier substrate 5, a UVlight radiation is directed to the sacrificial layer 10 beneath theglass substrate 5 by means of a laser unit so that the sacrificial layer10 absorbs the UV light and is thus heated. The heating degrades thesacrificial layer 10 in such a way that the linkage between the carriersubstrate 5 and the surface of the flexible interconnection element 6 isbroken. Thus, the carrier substrate 5 can be released from the flexibleinterconnection element 6 and the carrier substrate 5 can finally belifted off. The remaining structure which is depicted in FIG. 1 fcomprises the substrate 1 on which the flexible interconnection element6 is selectively connected by the previously patterned bonding layer 7.

Thereafter, as shown in the process state of FIG. 1 g, the number ofdevices on the first substrate 1 are separated from each other whereby aportion of the first substrate 1, on which the flexible interconnectionelement 6 is not bonded by a first region 8 of the bonding layer 7, isalso removed. The portion of the first substrate 1 that is removed isthereafter referred to as the sacrificial substrate portion. Thesacrificial substrate portion is removed e.g. by an etch process or by adicing process, wherein the etching and/or the dicing does not or onlynegligibly affect the flexible interconnection element 6.

As illustrated in FIG. 1 h, a device is obtained on which a flexibleinterconnection element 6 is attached and extends therefrom whichprovides a flexible interconnection to the electronic circuits on thedevice.

The electrical connecting of the signal lines included in the flexibleinterconnection element 6 with the contact pads of the integratedcircuit 4 in the substrate 1 can be selectively performed preferablyafter the process state shown in FIG. 1 f. Therefore, a trench structure(not shown) is provided in the flexible interconnection element 6 at alocation at which the signal line and the contact pad are arranged ontop of each other with respect to the upper surface 2 of the substrate1. The trench structure is adapted to extend up to the contact padthrough the interconnection element 6 whereafter the trench is filledwith an electrically conductive material to provide a connection betweenthe contact pad and the signal line.

According to a further embodiment of the present invention, in FIGS. 2 ato 2 p, a process is illustrated for fabricating an electro-opticaldevice which can be electrically driven by providing electrical signalsvia the flexible interconnection element to be attached thereon. Withrespect to the illustrated embodiment, the process steps for fabricatingthe flexible interconnection element 6 on the substrate surface areillustrated in more detail.

As shown in FIG. 2 a, a first substrate 20 is structured to provide athrough-hole 21 extending through the first substrate 20 from the uppersurface 22 to a lower surface 23. The first substrate 20 may compriseany material, preferably and in this example silicon. The through-hole21 also referred to as a via can e.g. be produced by drilling,deep-etching or the like. If the through-hole 21 is deep-etched, furthertrenches for breaking the first substrate 20 into several dices can beprovided such that only one wafer-level-process step may be used, whichfacilitates manufacturing.

In a next step, as shown in the state of FIG. 2 b, the silicon firstsubstrate 20 is subjected to an oxidization process to provide a silicondioxide layer 24 on the surfaces 22, 23 of the first substrate 20,thereby passivating the surface of the silicon first substrate 20.According to a preferred embodiment the thickness of the silicon dioxidelayer 24 is between 1 and 10 μm, more preferably 5 μm. The through-hole21 serves as a waveguide hole of the optoelectronic element to be built.

The next process state, as shown in FIG. 2 c, shows a carrier substrate25 separately provided, on which a sacrificial layer 26 is deposited.The carrier substrate 25 preferably comprises a transparent materialsuch as glass or the like. If the thermal expansion coefficient issubstantially equal to that of the silicon first substrate 20, in afollowing step of bonding a better alignment of the flexibleinterconnection element to the first substrate 20 can be achieved.

The sacrificial layer 26 comprises a polymer material, such as polyimidewhich is sensitive to radiation of a predetermined wavelength, such asUV light. On the sacrificial layer 26, a first layer 27 of a flexiblematerial, e.g. BCB, is deposited.

As shown in the drawings of FIGS. 2 d and 2 e, in the next step a metallayer 28, preferably including copper, aluminium or the like, isdeposited, e.g. by evaporating, sputtering, plating, from which signallines are to be formed. Thereafter a masking pattern 29, e.g. of siliconoxide is applied to select the regions in which the signal lines shallbe located within the flexible interconnection element.

In FIG. 2 e, the result of an etch process is shown wherein the maskingpattern 29 and the metal layer 28 in a region which was not covered bythe masking pattern 29 are removed such that a metal region 30, alsoreferred to as interconnection element, remains on the first layer 27which defines the signal lines in the flexible interconnection elementto be formed.

Thereafter, a second layer 31 of a flexible material is applied to thesurface so that the signal lines are encapsulated by the first andsecond layers 27, 31 of the flexible material. The material of thesecond layer 31 can be the same as the material of the first layer 27,i.e. e.g. BCB, or can be a material different therefrom but is selectedto provide a flexibility for the flexible interconnection element. Theresult of this process step is shown in FIG. 2 f.

The steps of FIG. 2 d to 2 f can be repeated once or a plurality oftimes to provide a flexible structure having more than oneinterconnection element therein, i.e. providing and structuring afurther metal layer and applying a third layer thereon.

In FIG. 2 g, a process state is shown after selectively applying abonding material 32 to the upper surface of the second layer 31. Thebonding material 32 forming the bonding layer is only applied in aregion in which an attachment of the flexible interconnection elementand the first substrate 20 is to be obtained. In regions in which theflexible interconnection element should be movable and able to be bentaway from the surface of the first substrate 20, no bonding material 32is applied. Patterning of the bonding layer 32 can be performed usingstandard technology steps comprising etching and masking as known fromthe conventional silicon technology.

As shown in the process state of FIG. 2 h, on the carrier substrate 25the flexible interconnection element 33, also referred to as a flexiblestructure 33, is attached. The carrier substrate 25 and the firstsubstrate 20 are adjoined so that the bonding material 32 comes intocontact with the upper surface of the silicon dioxide layer 24 of thefirst substrate 20. The bonding is performed by melting the bondinglayer 32, using a heating process which is performed at suchpredetermined temperatures that no other material used in the previousprocesses is affected in such a way that the final function of thedevice substantially deteriorates.

After finishing the bonding process, the sacrificial layer 26 isdissolved as shown in the process state of FIG. 2 i. This can be carriedout by applying a radiation having a wavelength to which the material ofthe sacrificial layer 26 is sensitive. Furthermore, the material of thecarrier substrate 25 is selected so that it is substantially transparentfor the wavelength of the radiation. In the given material, polyimide ispreferably used as the material for the sacrificial layer 26, absorbingUV light so that the sacrificial layer 26 can be heated by directing UVlight to it. The carrier substrate 25 should then be substantiallytransparent for UV light. After destroying, i.e. degrading, thesacrificial layer 26, the carrier substrate 25 can be removed whichresults in the process state shown in FIG. 2 j.

As shown in the process state of FIG. 2 k, the flexible interconnectionelement 33 is removed in a portion above the through-hole in the firstsubstrate 20 by means of a further masking and etching process to forman aperture. Preferably by means of the same masking and etchingprocess, the second layer 31 of the flexible material is etched incontact regions 34 to provide cavities in the second layer 31 and touncover the signal lines 30 in the contact region 34 for a successiveprovision of contact pads.

As a next step shown in FIG. 2 l, the cavities in the second layer 31 ofthe flexible material are filled with a conductive material such as Ni,Au etc., preferably using electroless plating on the signal lines inorder to produce contact pads 36, also referred to as contact elements.

In the next step, a result of which is shown in the process state ofFIG. 2 m, the devices fabricated on the first substrate 20 are separatedso that a part of the flexible interconnection element 33 has a releasedend and can be bent away from the surface of the first substrate 20which is illustrated by the movement indicated by the arrow M.

For completion of the electrooptical device, an optoelectronic element38 is soldered on the contact pads 36 by means of solder deposits 39,e.g. in the form of domes, columns or spherical balls, so that theoptoelectronic element 38 is in electrical contact with the signal linein the flexible interconnection element 33. The optoelectronic element38 comprises at least one of a laser diode, a photodetector or the like.The optoelectronic element 38 is aligned on the device shown in FIG. 2 nso that its optically active or sensitive area is situated above thethrough-hole 21 such that in case of the optoelectronic element 38including a laser diode, a laser beam is emitted through thethrough-hole 21 and in case of the optoelectronic element 38 including aphotodiode, a light beam directed through the through-hole 21 can bereceived. The optoelectronic element 38 can be bonded to the contactpads 36 by means of a flip-chip bonding technique which is well-known inthe art.

As illustrated in FIG. 20, the through-hole 21 and the cavity formed bythe first substrate 20, the flexible interconnection element 33 and theoptoelectronic element 38 are filled with an optical polymer 40, alsoreferred to as transparent filling material. The polymer 40 is cured toprovide firstly a waveguide for a light beam sent or received by theoptoelectronic element 38, and secondly a mechanical support for theelectrooptical device 38 on the first substrate 20 after curing theoptical polymer. As an optional last step to complete the electroopticaldevice, the backside of the first substrate 20 is polished so as toprovide a plane coupling area for coupling light into the opticalpolymer 40 or out of it. Hence the filling material 40 is filled in sucha way that the surface of the first substrate 20 opposite to the surfaceon which the flexible structure 33 is arranged, and the filling material40 in the via 21 together form a common plane.

The result of the method producing an electro-optical device is shown inFIG. 3. The step of producing the contact pads 36 can also be performedin a further region 41 of the flexible interconnection element 33 toallow the connecting of a further integrated device, e.g. containing anintegrated circuit for driving or amplifying signals directed to theoptoelectronic element 38 or received from it.

In FIG. 4, the application of an electrooptical device as shown in FIG.3 is illustrated. The application of FIG. 4 comprises a printed circuitboard 50 which has a recess 51 in which the heat sink 52 and theelectrooptical device 53 are arranged. Within the printed circuit board50, three, or any other number than three, layers of optical guides 54are included wherein the optical guides 54 end at the sidewalls of therecess 51.

The heat sink 52 is attached to the electrooptical device 53 wherein theoptoelectronic element 38 is in contact with the heat sink 52 so that athermal conductivity between the optoelectronic element 38 and the heatsink 52 is held on the printed circuit board 50. The electroopticaldevice 53 is arranged in the recess 51 of the printed circuit board 50,so that the openings of the through-hole (in the shown example, threethrough-holes are provided) are placed in a manner that they are incontact with the ends of the optical guides 54 included in the printedcircuit board 50.

As described with regard to the electro-optical device shown in FIG. 3,(but not shown in detail in FIG. 4) a number of further contact pads 43is provided in a region 41 on the flexible interconnection element 33such that a driver or an amplifier device 57 may be connected to thefurther contact pads 43 to contact the signal lines in the flexibleinterconnection element 33 such that the optoelectronic element 38 canbe driven or signals therefrom amplified.

The flexible interconnection element 33 has a length extending from theelectrooptical device such that it can be led to a surface of theprinted circuit board 50. On the surface of the printed circuit board50, wiring and contact regions of the printed circuit board 50 are hereprovided which are connected to the signal lines in the flexibleinterconnection element 33 by soldering to solder contacts or anothersuitable interconnection process. Via the wiring on the printed circuitboard 50, the optoelectronic element 38 of the electrooptical device canbe electrically connected so that the electrooptical device can beoperated by the signals provided via the wiring on the printed circuitboard 50.

Instead of filling the through-hole 21 of the first substrate 20 with anoptical polymer 40 after attaching the optoelectronic element 38 to theflexible interconnection element 33 as shown with the process state ofFIG. 2 o, in an alternative embodiment an optical polymer 42 can beprovided in the through-hole 21 of the first substrate 20 after theoxidization of the silicon first substrate 20. In such a way, theoptical polymer 42 is provided before applying the flexibleinterconnection element 33 on the device and before soldering theoptoelectronic element 38 to the flexible interconnection element 33.Providing the first substrate 20 with the optical polymer 42 issubstantially performed in the same manner as illustrated with regard toFIG. 2 o. The result is an electrooptical device as illustrated in FIG.5. The difference between the embodiment of FIG. 5 and the embodiment ofFIG. 3 lies in that the space between the upper surface of the firstsubstrate 20 and the optoelectronic element 38 is not filled with theoptical polymer 40. Instead, with regard to the embodiment of FIG. 5,the through-hole 21 is filled with the optical polymer 42 so that theends of the through-hole 21 are in one plane with the main surfaces 22,23 of the first substrate 20. This allows for light to be coupled intothe optical polymer 42 in the through-hole 21 with a reduced loss due todispersion of the light which would result in a reduced efficiency of alight-detecting or light-emitting element integrated in theoptoelectronic element 38.

An optical board-to-backplane connector is described with regard toFIGS. 6 a to 6 e, 7, and 8 as another embodiment of the presentinvention. The optical signals are transmitted and detected on boardlevel. Several boards are usually connected with a backplane that servesas a passive interconnection platform between the boards. Thus, anoptical board-to-backplane connector element is used to provide theoptical interconnection.

According to a further embodiment of the present invention, a method forproducing such a connector element using the basic method as explainedwith regard to FIG. 1 is illustrated. As previously described withregard to the above-mentioned embodiments, a silicon wafer substrate 80as first substrate 80 is provided which is used to provide the devicebodies of the connector elements to be produced. As shown in FIG. 6 b,the first substrate 80 is structured such that a number of device bodies81 and 82 also referred to as a first area and a second area of thefirst substrate 80 are defined. Each of the device bodies 81, 82 isprovided with one or more grooves 83 in which alignment pins can beengaged. The grooves 83 and the alignment pins are species of alignmentelements engaging to perform alignment. The grooves 83 are preferablyetched by means of known etching processes, e.g. an anisotropic wetetching process. Furthermore, between the areas for the device bodies81, 82, slit openings 84, also referred to as spacing regions, areprovided in which the material of the first substrate 80 is removed sothat the device bodies 81, 82 are separated by the slit openings 84. Thewidth of the slit openings 84 defines the length of the flexibleinterconnection between the device bodies 81, 82 which later form theconnector elements.

To provide the flexible interconnection elements 86, also referred to asa flexible structure, a glass second substrate 85, as shown in FIG. 6 c,is provided on which the flexible interconnection elements 86 asdescribed with regard to FIG. 2 b to 2 g are deposited. This processstate is shown in FIG. 6 d. Instead of electrical signal lines, in thisembodiment optical signal lines are provided which may be fabricated inthe same manner as the electrical signal lines by selecting an opticalguide material instead of a conducting material for the signal lines.

In a following process step, the structured first substrate 80 of FIG. 6b and the flexible interconnection elements 86 applied on the secondsubstrate 85, as shown in FIG. 6 d, are adjoined so that the flexibleinterconnection elements 86 are applied to the first substrate 80aligned with the connector elements and particularly with the alignmentgrooves 83 in the device bodies 81, 82 (FIG. 6 e).

The adjoining is performed in the same manner as described before withregard to FIG. 1 e. Instead of providing grooves 83 in the device bodies81, 82, other structures such as protruding structures can be depositedprior to or after bonding of the first substrate 80 and the secondsubstrate 85. After lifting off of the second substrate 85, alignmentelements, e.g. in the form of alignment pins, also referred to as guidepins, are arranged in the alignment grooves 83 and an encapsulationlayer 87 is deposited on the surface of the so-processed first substrate80. In an optional embodiment, the slit openings 84 can also be providedafter joining the substrates 80, 85 instead of providing them beforejoining as described as described with regard to FIG. 6 b.

Thereafter, the device bodies 81, 82 are separated by means of anetching or dicing process so that connector elements are produced havingtwo plugs 89 which are interconnected by means of the flexibleinterconnection element 86. The front view of such a plug 89 is depictedin FIG. 7. The flexible interconnection element 86 is embedded in acommon structure formed by the device bodies 81, 82 and theencapsulation layer 87. The alignment pins 88 protrude, thereby allowingan alignment of the plug 89 to a respective interface.

The bonding of the second substrate 85 to the first substrate 80 isperformed in the area of the device bodies 81, 82 only, wherein thebonding polymer is previously removed through a patterning processbetween the device bodies 81, 82.

In FIG. 8, a side view of such a connector element is illustratedincluding the protruding alignment pins 88. The front surface shown inFIG. 7 is plane, so that the flexible interconnection element 86 has itsend in one plane with the front surfaces of the device bodies 81, 82 andthe encapsulation layer 87. The optical signal lines (not shown)provided in the flexible interconnection element 86 can thereby beconnected if the front surface of the connector element abuts arespective surface in which optical guides are included.

Such a connector element can be applied in a board-to-backplanearrangement which is illustrated in FIG. 9. FIG. 9 shows a backplane 100which includes optical guide lines 101 which end in the sidewall of arecess 102. On the backplane 100, a first alignment element 103 isattached which includes a first engagement means 105. A second alignmentelement 106 is provided which is coupled to a printed circuit board 107to be connected with the optical guide lines 101 in the backplane 100.The second alignment element 106 comprises second engagement means 108which are adapted to engage with the first engagement means 105 so as toprovide a mechanical support between the backplane 100 and the printedcircuit board 107.

The backplane 100 as well as the printed circuit board 107 are providedwith a receptacle element 109, 110 which is adapted to engage with arespective recess 111 in the plugs 112 of the connector element, assubstantially illustrated with regard to FIGS. 6 to 8. The receptacleelements 109, 110 are arranged in such a way that optical guides in theprinted circuit board 107 abut with their ends at the ends of theoptical signal lines 115 provided in the plugs 112 of the flexibleinterconnection element 114.

Any of the described embodiments maybe combined in part or in total. Theterminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of the invention. Asused herein, the singular forms “a”, “an” and “the” are intended toinclude the plural forms as well, unless the context clearly indicatesotherwise. It will be further understood that the terms “comprises”and/or “comprising,” when used in this specification, specify thepresence of stated features, integers, steps, operations, elements,and/or components, but do not preclude the presence or addition of oneor more other features, integers, steps, operations, elements,components, and/or groups thereof.

The corresponding structures, materials, acts, and equivalents of allmeans or step plus function elements in the claims below are intended toinclude any structure, material, or act for performing the function incombination with other claimed elements as specifically claimed. Thedescription of the present invention has been presented for purposes ofillustration and description, but is not intended to be exhaustive orlimited to the invention in the form disclosed. Many modifications andvariations will be apparent to those of ordinary skill in the artwithout departing from the scope and spirit of the invention. Theembodiment was chosen and described in order to best explain theprinciples of the invention and the practical application, and to enableothers of ordinary skill in the art to understand the invention forvarious embodiments with various modifications as are suited to theparticular use contemplated.

Having thus described the invention of the present application in detailand by reference to embodiments thereof, it will be apparent thatmodifications and variations are possible without departing from thescope of the invention defined in the appended claims.

1. A method for producing a flexible structure attached to a devicecomprising: providing a first substrate; providing a second substrate;providing a flexible structure releasably attached to the secondsubstrate; providing a bonding layer on at least one of the firstsubstrate and the flexible structure; adjoining the first and secondsubstrate such that the flexible structure is attached on the firstsubstrate by means of the bonding layer; detaching the second substratesuch that the flexible structure remains on the first substrate.
 2. Themethod according to claim 1, wherein the bonding layer is structured todefine a first region in which the flexible structure is attached on thefirst substrate and a second region in which the flexible structure isuncoupled from the first substrate.
 3. The method according to claim 2,wherein the second substrate is removed in the second region such thatthe flexible structure extends beyond the remaining first region.
 4. Themethod according to claim 1, wherein a sacrificial layer is providedbetween the second substrate and the flexible structure and wherein thedetaching of the second substrate is performed by degrading thesacrificial layer.
 5. The method according to claim 1, wherein thesacrificial layer is adapted such that the flexible structure isreleased from the second substrate by applying light through the secondsubstrate to the sacrificial layer.
 6. The method according to claim 5,wherein the second substrate is selected to be transparent for thewavelength of the light applied to release the second substrate.
 7. Themethod according to claim 6, wherein alignment elements are provided onthe first and second substrate for aligning the first substrate andsecond substrate relatively to each other.
 8. The method according toclaim 1, wherein the bonding layer comprises a polymer having a lowerglass transition temperature than each of the materials of the firstsubstrate, the second substrate and the flexible structure.
 9. Themethod according to claim 1, wherein the thermal expansion coefficientsof the first substrate and second substrate are substantially equal. 10.The method according to claim 1, wherein the flexible structure isprovided including an interconnection element as at least one of anoptical, a mechanical and an electrical interconnection element.
 11. Themethod according to claim 10, wherein providing the flexible structurecomprises: providing a first flexible layer on the second substrate;providing the interconnection element on the first flexible layer; andproviding a second flexible layer to cover the first flexible layer andthe interconnection element.
 12. The method according to claim 11,wherein at least one of the materials of the first layer and the secondlayer is selected from a group consisting of a BCB polymer, polyimideand liquid crystal polymer.
 13. The method according to claim 10,wherein the interconnection element is provided as an electricallyconducting element, wherein the flexible structure is patterned touncover the interconnection element at least in a contact region,wherein the contact region is filled with a conducting material toprovide a contact element on the flexible structure.
 14. The methodaccording to claim 13, wherein the first substrate is processed byforming a via through the first substrate; and the method furthercomprising connecting an optoelectronic element to the interconnectionelement of the flexible structure by means of the contact element,wherein the optoelectronic element is arranged that either light is sentthrough the via, light is received through the via, or both.
 15. Themethod according to claim 14, wherein the bonding layer and the flexiblestructure each comprise an aperture and wherein the first and the secondsubstrates are adjoined such that the aperture is aligned with the viain the second substrate.
 16. The method according to claim 15, whereinthe via and the aperture are filled with a transparent filling materialwhich gets into contact with the optoelectronic element.
 17. The methodaccording to claim 16, wherein the filling material is filled in such away that a surface of the first substrate opposite to the surface onwhich the flexible structure is arranged, and the filling material inthe via together form a common plane.
 18. The method according to claim10, further comprising: wherein the first substrate is provided in sucha way that a first and a second area of the first substrate are defined;wherein adjoining the first and second substrate is performed such thatthe flexible structure is provided to bridge the first and the secondarea; and wherein the first and second area are separated from the firstsubstrate to obtain a first and a second plug connected by the flexiblestructure to provide the flexible connector.
 19. The method according toclaim 18 wherein the first and second area are separated such that theflexible structure has an end which is in one plane with a front surfaceof the separated first and second area, respectively.
 20. The methodaccording to claim 18, wherein an encapsulation layer is provided on thefirst and the second plug.
 21. The method according to claim 20, furthercomprising: providing a groove in at least one of the first and secondarea; and inserting a guide pin into the groove.
 22. The methodaccording to claim 21, wherein the guide pin is inserted so that theguide pin extends beyond the front surface of the first and second plug.23. The method according to claim 21, wherein the guide pin is pulledout to provide a guide cavity.
 24. The method according to claim 18,wherein the first substrate includes a spacing region between the firstand second region wherein the material of the first substrate isremoved.
 25. A device comprising: a processed substrate; a flexiblestructure comprising a flexible material; and a patterned bonding layerbetween the substrate and the flexible structure; wherein the flexiblestructure extends beyond the substrate.
 26. The device according toclaim 25, further comprising a first and a second plug that areseparated and interconnected by the flexible structure.
 27. The deviceaccording to claim 26, wherein the flexible structure and at least oneof the first and second plug comprise a common plane front surface. 28.The device according to claim 27, wherein at least one of the first andsecond plug comprising an encapsulation layer is arranged.
 29. Thedevice according to claim 28, wherein in at least one of the first andsecond plug a guide pin is arranged which protrudes from the commonplane front surface.
 30. The device according to claim 25, wherein in atleast one of the first and second plug a guide aperture is arrangedwhich extends from the common plane surface.
 31. The device according toclaim 25, wherein the flexible structure includes an interconnectionelement to provide at least one of an electrical and opticalinterconnection.
 32. The device according to claim 25, wherein a via isarranged through the first substrate and the flexible structure, whereinthe flexible structure comprises a contact element, wherein anoptoelectronic element is arranged on the flexible structure such thatthe optoelectronic element is in contact with the contact element,wherein the optoelectronic element is directed that light is one oftransmitted through the via, received through the via, or both.
 33. Thedevice according to claim 31, wherein the via is filled with atransparent material to guide the light beam to the optoelectronicelement.
 34. The device according to claim 32, wherein the flexiblestructure comprises further contact elements which are contacted by afurther device, wherein the further device comprises at least one of adriver and an amplifier circuit.